We've been seeing a few alternative chip technologies be tossed around lately since it's hard to believe that current manufacturing methods can get much more precise than 65 or 40 nanometers, but IBM ain't having none of that pessimistic talk, claiming that they've developed a way to extend optical lithography down to 30nm. The new method uses some fancy fluid immersion to help slow down the etching lasers, but doesn't require a large revamp of the manufacturing process like the proposed X-ray method or other plans for Moore's Law continuation. Hopefully this means we'll have cheap methods of low-heat, high-speed computing for the foreseeable future instead of having to spring for those brain-in-a-vat boxes which we hear are just around the corner.

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IBM's new 30nm process keeps Moore's Law intact